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Nexus Mini™ Series

mini
System Specification
Process Type Thermal time divided ALD
Gases Flow Type Lateral type(Traveling wave)
Available Film Dielectric thin film (High-K, Low-K)
Metal oxide thin film based H₂O
Metal oxide thin film based Ozone gas ( Optional )
Film Uniformity Al₂O₃ ± 1% on the 200x200 [mm²] square substrate
Substrate Size & Temperature Nexus Mini 2.5 : 25 ~ 250 [℃] ± 1 [%] On The Substrate of 8” or 200x200[mm²]
Nexus Mini 4.0 : 25 ~ 400 [℃] ± 1 [%] On The Substrate of 6” or 150x150[mm²]
System Dimension
( W x L x H )
800 x 480 x 440 (Substrate to ground) [mm]
Base Pressure < 5.0 x 10-3 [Torr]
Control System Provided laptop computer & Windows 10 based, advanced and basic GUIs with
Import/export of Excel compatible recipes and data
Number of MFC Carrier & purge gas / 3[EA] & 2nd reactant gas / 1EA
Optional Install max 2 bubbler and 1 self evaporation canister
Ozone generator
Facilities Requirements Specification
Gases Ar or N₂ more than 4~6 [bar]
Air Clean dry air or N₂ more than 4~6 [bar]
Power Ø1 / 220 [V] / 60 [Hz] / more than 50 [A]
Vacuum Pump Needed vacuum oil rotary pump ≥1000 [L/min]
 

Linear Growth without growth delay from 100 to 400 cycles at process temperature of 100℃.