System Specification |
Process Type |
Thermal time divided ALD |
Gases Flow Type |
Lateral type(Traveling wave) |
Available Film |
Dielectric thin film (High-K, Low-K)
Metal oxide thin film based H₂O
Metal oxide thin film based Ozone gas ( Optional )
|
Film Uniformity |
Al₂O₃ ± 1% on the 200x200 [mm²] square substrate |
Substrate Size & Temperature |
Nexus Mini 2.5 : 25 ~ 250 [℃] ± 1 [%] On The Substrate of 8” or 200x200[mm²]
Nexus Mini 4.0 : 25 ~ 400 [℃] ± 1 [%] On The Substrate of 6” or 150x150[mm²] |
System Dimension ( W x L x H ) |
800 x 480 x 440 (Substrate to ground) [mm] |
Base Pressure |
< 5.0 x 10-3 [Torr] |
Control System |
Provided laptop computer & Windows 10 based, advanced and basic GUIs with
Import/export of Excel compatible recipes and data |
Number of MFC |
Carrier & purge gas / 3[EA] & 2nd reactant gas / 1EA |
Optional |
Install max 2 bubbler and 1 self evaporation canister
Ozone generator |
Facilities Requirements Specification |
Gases |
Ar or N₂ more than 4~6 [bar] |
Air |
Clean dry air or N₂ more than 4~6 [bar] |
Power |
Ø1 / 220 [V] / 60 [Hz] / more than 50 [A] |
Vacuum Pump |
Needed vacuum oil rotary pump ≥1000 [L/min] |