| System Specification |
| Process Type |
Spatial Divided Thermal ALD by Single Substrate Scan |
| Substrate Size |
2G(370mm x 470mm) or 200 x 200mm2 |
| Substrate Moving Speed |
Max 800mm/s |
| Deposition Rate |
Al2O3 ≥ 70Å/min |
| Base Pressure |
< 5.0 x 10-3 Torr |
| Range in Processing Pressure |
> 0.5 Torr |
System Dimension
( W x L x H ) |
1500mm x 500mm x 350mm(Height) |
| Optional |
Install max 4EA Number of Canister
Added Throttle Valve |
| Facilities Requirements Specification |
| Gases |
Ar, More than 4~6 Bar |
| Air |
CDA, More Than 4~6 Bar |
| Power of Mini ALD |
AC 220 V± 10%, 3 Phase, 50 Hz |
| Vacuum Pump |
Needed Vacuum Oil Rotary Pump ≤1000 L/min |
