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Display, Semiconductor High Throughput Spatial ALD
 
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Linear Spatial ALD System Configuration

  • Space Divided with Plasma/Thermal
    - High Throughput (ALD 1 Cycle : ＜0.4")
    - Multi Layer with Each Precursor Dosing
    - Low Particle / Contamination (Top Pumping)
  • Available Temperature Range : ＜ 180 ℃
    • Semiconductor _ Develop 中
    Semiconductor

    Rotation Spatial ALD System Configuration

  • Space Divided Thermal Reaction with O3
    - High Throughput (ALD 6 Cycle / 1 Rotation)
    - Multi Layer with Time Divided of Each Precursor
    - Low Particle / Contamination (Top Pumping)
  • Available Temperature Range : ＜ 400 ℃
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