Nexus Mini™

Nexus Mini™ Series

System Specification
Process Type	Thermal time divided ALD
Gases Flow Type	Lateral type(Traveling wave)
Available Film	Dielectric thin film (High-K, Low-K) Metal oxide thin film based H₂O Metal oxide thin film based Ozone gas ( Optional )
Film Uniformity	Al₂O₃ ± 1% on the 200x200 [mm²] square substrate
Substrate Size & Temperature	Nexus Mini 2.5 : 25 ~ 250 [℃] ± 1 [%] On The Substrate of 8” or 200x200[mm²] Nexus Mini 4.0 : 25 ~ 400 [℃] ± 1 [%] On The Substrate of 6” or 150x150[mm²]
System Dimension ( W x L x H )	800 x 480 x 440 (Substrate to ground) [mm]
Base Pressure	< 5.0 x 10-3 [Torr]
Control System	Provided laptop computer & Windows 10 based, advanced and basic GUIs with Import/export of Excel compatible recipes and data
Number of MFC	Carrier & purge gas / 3[EA] & 2^nd reactant gas / 1EA
Optional	Install max 2 bubbler and 1 self evaporation canister Ozone generator
Facilities Requirements Specification
Gases	Ar or N₂ more than 4~6 [bar]
Air	Clean dry air or N₂ more than 4~6 [bar]
Power	Ø1 / 220 [V] / 60 [Hz] / more than 50 [A]
Vacuum Pump	Needed vacuum oil rotary pump ≥1000 [L/min]

Linear Growth without growth delay from 100 to 400 cycles at process temperature of 100℃.

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넥서스비 대표자 : 최학영 사업자등록번호 : 598-86-00307 | Mail hagyoung.choi@nexusbe.com
주소 : 경기도 용인시 기흥구 탑실로 42
전화 : 031-299-2789 (+82.031.299.2789) 063-225-2789 (+82.063.225.2789)
팩스 : 031-299-2788 (+82.031.299.2788) 063-225-2788 (+82.063.225.2788)